ARMOUR JACKET MASTERSHIELD WITH LINER "SAND" SS25 brushed surface that feels smooth

brushed surface that feels smooth and velvety to the touch

HOOLYWOOD draws inspiration from U

while the interior is a 100% cotton jersey with a smooth

while the right zipper leads to a separate pocket

Zip Fastener

ARMOUR JACKET MASTERSHIELD WITH LINER "SAND" SS25 brushed surface that feels smoothDetails: Founded in 2016 by Samuel Wei and Daniel Gu, Motiv is an independent studio dedicated to creating clothing rooted in tradition yet designed for the future. Drawing from tailoring and workwear heritage, reinterpreting classic methods into garments that respond to the modern wearer and their environment. Every piece is crafted in house by a small team in Beijing, where skilled craftspeople and specialized equipment to merge anatomical tailoring